東京都市大学 ナノエレクトロニクス研究室
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2017.11

2017.11.14 06:29

Hole generation associated with intrinsic defects in SOI-based SiGe thin films formed by solid-sour…

(111)“Hole generation associated with intrinsic defects in SOI-based SiGe thin films formed by solid-source molecular beam epitaxy”Motoki Sa...

2017.11.11 12:44

Thermal stability of compressively strained Si/relaxed Si1-xCx heterostructures formed on Ar ion im…

“Thermal stability of compressively strained Si/relaxed Si1-xCx heterostructures formed on Ar ion implanted Si (100) substrates”You Arisawa,...

2017.11.01 12:49

Light emission enhancement from Ge quantum dots with phosphorous δ-doped neighboring confinement st…

“Light emission enhancement from Ge quantum dots with phosphorous δ-doped neighboring confinement structures”K. Sawano, T. Nakama, K. Mizuta...

2017.11.01 12:40

Control of electrical properties in Heusler-alloy/Ge Schottky tunnel contacts by using phosphorous …

“Control of electrical properties in Heusler-alloy/Ge Schottky tunnel contacts by using phosphorous δ-doping with Si-layer insertion” Michih...

2017.11.01 12:39

Fabrication of high-quality strain relaxed SiGe(1 1 0) films by controlling defects via ion implanta

Fabrication of high-quality strain relaxed SiGe(1 1 0) films by controlling defects via ion implantationM. Kato, K. Arimoto, J. Yamanaka, K....

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